Intel adopts ASML's new generation equipment for mass production of laptop chips

ASML revealed on Tuesday that Intel has confirmed the purchase of the company's high-end lithography machines for the contract manufacturing of some flagship Panther Lake laptop processors. This move will also help the chip manufacturer become proficient in the use of this equipment.

ASML stated that after Intel launched relevant trials in 2024, it has officially started using ASML's new generation of high numerical aperture extreme ultraviolet lithography (High NA EUV) machines to etch circuit patterns for some of its Panther Lake processors.

The industry has long debated when the large-scale deployment of high NA equipment would be economically viable. As chip processes continue to shrink to atomic-level sizes, major chip manufacturers will increasingly rely on this equipment in the future.

A single high NA lithography machine costs about $400 million, which is twice the price of conventional EUV equipment, and the difficulty of integrating this equipment into production lines is extremely high.

Intel will only use the high NA equipment for specific layers of chip processes, collecting data through mass production practices and continuously optimizing equipment performance in collaboration with ASML.

Intel has not commented on this news.

The Panther Lake chips are built using Intel's 18A process, which has previously utilized ASML's conventional EUV lithography machines for production. The lithography process involves using beams to draw complex circuit layouts on wafers, which is a core step in chip manufacturing.

In 2024, Intel received its first high NA lithography machine at its research and development base in Hillsboro, Oregon, which is dedicated to developing new chip manufacturing processes and technologies